| Autor: |
Tomonao Hosokai, Hiroto Sato, Takahiro Shirai, Shinsuke Mouri, Daiki Yamatani, Kiyoyuki Kabuki, Kazuaki Hotta, Yuki Joshima, Takahiro Inoue, Koji Miyauchi, Takuma Yokoyama, Yusuke Teramoto, Toshio Yokota, Gohta Niimi, Hiroshi Mizokoshi, Tetsu Takemura, Kohkan C. Paul, Hironobu Yabuta, Kazunori Bessho, Zenzo Narihiro |
| Rok vydání: |
2007 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.728711 |
| Popis: |
Discharge-produced plasma (DPP)-based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka RDsr within 2 % bandwidth around 13.5 nm. Using a nested grazing-incidence collector, EUV power at the intermediate focus which is defined as an interface to the exposure tool reached 62 W with 3.3 mm2sr of etendue. Tin deposition rate on the collector surface, which is the concern in any tin-fueled EUV sources, was decreased by four orders of magnitude as a result of debris-shield development. Cleaning processes were also developed to enhance total lifetime of the collector. A sequence of intentional deposition and cleaning process for the ruthenium grazing-incidence mirror sample was repeated 13 times. By measuring reflectivity of the mirror, it was confirmed that halogen cleaning process worked very effectively and did not get the mirror damaged after such a long-term cleaning experiment. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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