| Autor: |
Peter van der Cruijsen, Marc van Veenhuizen, Frank Zachariasse, Keith A. Serrels |
| Rok vydání: |
2019 |
| Předmět: |
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| Zdroj: |
International Symposium for Testing and Failure Analysis. |
| ISSN: |
0890-1740 |
| Popis: |
High numerical aperture (NA) laser scanning for fault localization requires the use of special lenses aimed at creating a tightly focused laser spot within an integrated circuit. Typically, extrinsic solid immersion lenses are employed that optimize the refraction at the air-silicon surface. In this feasibility study we investigate with both simulations and experiments the use of integrated diffraction lenses for high-NA imaging. We take the limit to ultrathin silicon and discuss the implications for the lens design and performance. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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