Modification of Mo/Si multilayer coating by processing with fs laser pulses
| Autor: | Frederik Blumrich, Yuval Perets, Sergey Oshemkov, Vladimir Kruglyakov |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
White light interferometry
Materials science business.industry Extreme ultraviolet lithography 02 engineering and technology engineering.material 021001 nanoscience & nanotechnology Laser 01 natural sciences law.invention 010309 optics Optics Optical coating Coating law Extreme ultraviolet 0103 physical sciences engineering Optoelectronics Photomask 0210 nano-technology business Lithography |
| Zdroj: | 2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). |
| DOI: | 10.1109/cleoe-eqec.2017.8087280 |
| Popis: | Mo/Si multilayer (ML) coatings are widely used as reflective coatings of XUV optics, particularly — mirrors and photomasks in EUV (13.5 nm) lithography. Therefore, the problem of controllable change of optical properties of such coatings, first of all — reflectivity in EUV spectral field without coating surface damage is important for some applications in EUV lithography like black border formation [1] and critical dimensions control [2]. |
| Databáze: | OpenAIRE |
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