Application of reduced-pressure plasma CVD technology to the fabrication of Er-doped optical fibers
| Autor: | Andrei S Kurkov, E. M. Dianov, Vladimir Karpov, S L Semenov, V. N. Protopopov, A.G. Shebuniaev, R.R. Khrapko, Konstantin M. Golant |
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| Rok vydání: | 1994 |
| Předmět: |
Optical fiber
Materials science Fabrication business.industry Organic Chemistry Doping technology industry and agriculture chemistry.chemical_element Mineralogy Cladding (fiber optics) Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Inorganic Chemistry Erbium chemistry law Optoelectronics Electrical and Electronic Engineering Physical and Theoretical Chemistry business Luminescence Hard-clad silica optical fiber Refractive index Spectroscopy |
| Zdroj: | Optical Materials. 3:181-185 |
| ISSN: | 0925-3467 |
| DOI: | 10.1016/0925-3467(94)90003-5 |
| Popis: | For the first time the reduced-pressure plasma CVD technology was applied to fabrication of active silica optical fibers with all-depressed index structure. Using surface plasma CVD method, fiber preforms with an Er-doped silica core and fluorine doped silica cladding have been prepared and tested. A possibility of high performance active fiber fabrication using the SPCVD has been demonstrated. An influence of fluorine co-doping on luminescence features of Er 3+ ions in a silica host has been examined. The erbium concentration-associated clustering effects in pure silica host synthesized by the SPCVD were compared with those in germanosilicate host synthesized by the MCVD. |
| Databáze: | OpenAIRE |
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