Influence of YAG Laser Frequency on a∶H-Si Thin Films Micro-Crystallization

Autor:	周雨薇 Zhou Yuwei, 张竹青 Zhang Zhuqing, 王强 Wang Qiang, 花国然 Hua Guoran
Rok vydání:	2013
Předmět:	X-ray laser Materials science law business.industry Optoelectronics Electrical and Electronic Engineering Crystallization Laser frequency Thin film business Atomic and Molecular Physics and Optics law.invention
Zdroj:	Laser & Optoelectronics Progress. 50:021406
ISSN:	1006-4125
DOI:	10.3788/lop50.021406
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c3bab602caf2b55be9fd3df8e189ef6c https://doi.org/10.3788/lop50.021406 Zobrazit plný text záznamu