Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering
| Autor: | O. Zywitzki, G. Hoetzsch |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Materials science
Mineralogy Surfaces and Interfaces General Chemistry Substrate (electronics) engineering.material Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Amorphous solid Coating Sputtering Residual stress Phase (matter) Cavity magnetron Materials Chemistry engineering Composite material |
| Zdroj: | Surface and Coatings Technology. :640-647 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/s0257-8972(96)02992-1 |
| Popis: | It has been shown already that pulsed reactive magnetron sputtering (PMS) allows to deposit crystalline, hard and transparent Al2O3 layers. In this paper, correlations between process parameters, structure and properties of these layers are investigated. The deposition of the layers took place on steel at substrate temperatures (Ts) of 290–770°C. The sputtering power was varied in the range of 11–17 kW, and the substrate bias was 50 V. With increasing substrate temperature and sputtering power, a phase transition takes place from amorphous Al2O3 via λ-Al2O3 into α-Al2O3. At the highest sputtering power, textured γ-Al2O3 occurs already at Ts≈350°C. The formation of α-Al2O3 starts at 670°C, and practically pure α-Al2O3 is present at the highest substrate temperature. The substrate bias has a substantial influence on the ratio of the phase fractions of γ-Al2O3 and α-Al2O3. Linked with the formation of crystalline phases is an increases in hardness from 10 up to 22 GPa. In addition, a pronounced increase in residual stresses of the layers can be observed. Pulsed magnetron sputtering permits to coat substrate materials with hard, crystalline aluminum oxide that could not be treated up to now because the substrate temperatures were too high. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect