Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory
| Autor: | Yeong-Cheol Kim, Jin-Hoon Yang, Dong-Gung Shin, Ki-Young Kim |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Surface (mathematics) Materials science Hexachlorodisilane 02 engineering and technology Surface reaction 021001 nanoscience & nanotechnology 01 natural sciences chemistry.chemical_compound Atomic layer deposition chemistry Chemical engineering Computational chemistry 0103 physical sciences Ceramics and Composites Density functional theory Amorphous silica 0210 nano-technology |
| Zdroj: | Journal of the Korean Ceramic Society. 54:443-447 |
| ISSN: | 2234-0491 1229-7801 |
| DOI: | 10.4191/kcers.2017.54.5.11 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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