A novel approach to etch-process-aware intensive layout retarget

Autor:	Jeeyong Lee, Yangwoo Heo, Ryanggeun Lee, Sangwook Kim, Ji-Suk Hong, Kyoil Koo, Changmook Yim, Jungmin Kim, Sooyong Lee, Joonsung Kim, Dongho Kim, Seung-Hune Yang, Seongtae Jeong
Rok vydání:	2023
Zdroj:	Advanced Etch Technology and Process Integration for Nanopatterning XII.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c3117f2c2d9e18ea6182ce9c8ca23d2d https://doi.org/10.1117/12.2657880 Zobrazit plný text záznamu