Highly ordered metal oxide nanopatterns prepared by template-assisted chemical solution deposition
| Autor: | Clément Sanchez, Cédric Boissière, Monika Kuemmel, David Grosso, Lionel Nicole, Christel Laberty-Robert |
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| Rok vydání: | 2008 |
| Předmět: |
Materials science
Nanostructure Silicon chemistry.chemical_element Nanotechnology General Chemistry Substrate (electronics) Condensed Matter Physics Evaporation (deposition) Electronic Optical and Magnetic Materials Biomaterials chemistry Nano Materials Chemistry Ceramics and Composites Wafer Wetting Self-assembly |
| Zdroj: | Journal of Sol-Gel Science and Technology. 48:102-112 |
| ISSN: | 1573-4846 0928-0707 |
| DOI: | 10.1007/s10971-008-1794-0 |
| Popis: | TiO2, Al2O3, and ZrO2 patterns composed of ordered nano motifs of various morphologies (i.e. perforations (craters), rings, canyons, wires, dots, or channels) with typical lateral dimensions of less than 40 nm and thickness below 15 nm are presented. Simple chemical solution deposition (CSD) of molecular inorganic precursors and commercial block copolymers was used to create patterns on several substrate surfaces (bare, hydrophobized or gold covered silicon wafers and ITO). Self-assembly during evaporation and subsequent stabilization at 500 °C leads to the various nanostructures. Compared to other techniques for surface nano patterning, the present method has the advantage of being cheap, reproducible and easy to scale up and does not require specialized equipment. The type, dimension, and organization of these motifs were assessed by AFM, FE-SEM, spectroscopic ellipsometry, and GI-SAXS and are shown to depend on the conditions of preparation. Usage as model surfaces for modelling of wetting properties and as nanoelectrode arrays were investigated. |
| Databáze: | OpenAIRE |
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