Dose Control Strategy using Random Logic Device Patterns and Massive Metrology in a Foundry High Volume Manufacturing Environment
| Autor: | Kan Zhou, Xin Guo, Yu Yang Bian, Wen Zhan Zhou, Yu Zhang |
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| Rok vydání: | 2022 |
| Zdroj: | 2022 China Semiconductor Technology International Conference (CSTIC). |
| Databáze: | OpenAIRE |
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