Technology for forming micro devices based on gallium nitride
Autor: | B. I. Seleznev, A. V. Zhelannov, D. G. Fedorov |
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Rok vydání: | 2020 |
Předmět: | |
Zdroj: | IOP Conference Series: Materials Science and Engineering. 939:012082 |
ISSN: | 1757-899X 1757-8981 |
Popis: | The technology of forming micro devices based on gallium nitride, including the main stages of manufacturing, namely, inter-assembly isolation, formation of non-straightening (ohmic) and straightening (Schottky barrier) contacts, surface passivation, formation of inter-electric connections in the form of “air bridges”, plate grinding, cutting plate into crystals and sorting out, is considered. A short technological cycle of manufacturing microstructures with a description of the main operations is given. As a result of this work, experimental samples of transistors with a gate length of 0.5 microns were obtained. |
Databáze: | OpenAIRE |
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