Epitaxial bilayer growth of CaF2(111)/Pd(111) on CaF2(111) substrates
| Autor: | B. H. Jo, R. W. Vook |
|---|---|
| Rok vydání: | 1993 |
| Předmět: |
Reflection high-energy electron diffraction
Chemistry business.industry Scanning electron microscope Bilayer Surfaces and Interfaces Condensed Matter Physics Epitaxy Surfaces Coatings and Films Vacuum evaporation Crystallography Vacuum deposition Electron diffraction Optoelectronics Thin film business |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:1044-1047 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.578438 |
| Popis: | Epitaxial Pd(111) films were grown in UHV on air‐cleaved CaF2(111) substrates. Subsequently, epitaxial CaF2(111) films were grown on top of the Pd layer. All films were grown by vacuum evaporation techniques. The growth conditions, structure, and surface morphology of the evaporated epitaxial bilayers of Pd and CaF2 were studied with reflection high energy electron diffraction, x‐ray diffraction, and scanning electron microscopy. This epitaxial dielectric film/metal film/insulator substrate structure has possible important applications for monolithic microwave integrated circuit devices. |
| Databáze: | OpenAIRE |
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