Effect of Oxygen Ion Implantation on Physicochemical Structure and Corrosion-Electrochemical Behavior of Copper–Manganese Alloy
| Autor: | E. M. Borisova, A. A. Kolotov, I. K. Averkiev, O. R. Bakieva, V. L. Vorobiev, S. M. Reshetnikov, F. Z. Gil’mutdinov |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Potassium hydroxide
Materials science Inorganic chemistry Alloy General Engineering chemistry.chemical_element Hydrochloric acid Manganese engineering.material Electrochemistry Copper Corrosion chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry engineering General Materials Science |
| Zdroj: | Inorganic Materials: Applied Research. 12:581-587 |
| ISSN: | 2075-115X 2075-1133 |
| DOI: | 10.1134/s2075113321030394 |
| Popis: | The chemical composition and structure of the Cu–Mn alloy after modification with oxygen ions with an energy of 10–30 keV and a dose of 1017 cm–2 have been investigated. Changes in the type of chemical bonding and atomic structure in irradiated Cu–Mn samples have been studied by X-ray photoelectron spectroscopy and X-ray diffraction. Electrochemical studies of ion-modified surfaces have been performed by measuring the anodic potentiodynamic polarization curves in a neutral borate buffer solution, hydrochloric acid, and potassium hydroxide. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink