A Structural and Electrical Comparison of BCl and BF 2 Ion‐Implanted Silicon
| Autor: | M. E. Lunnon, M. Delfino |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Silicon
Renewable Energy Sustainability and the Environment Annealing (metallurgy) Inorganic chemistry Analytical chemistry chemistry.chemical_element Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion Secondary ion mass spectrometry Ion implantation chemistry Transmission electron microscopy Materials Chemistry Electrochemistry |
| Zdroj: | Journal of The Electrochemical Society. 132:435-440 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2113860 |
| Popis: | Etude par microscopie electronique des zones amorphes produites par implantation par BCl + et BF 2 + . Etude comparative du recuit a 900°C pendant 30 minutes. Caracteristiques des diodes fabriquees |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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