Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor
| Autor: | Alan W. Weimer, Steven M. George, Luis F. Hakim, J Blackson |
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| Rok vydání: | 2005 |
| Předmět: |
Scanning electron microscope
Chemistry Process Chemistry and Technology technology industry and agriculture Energy-dispersive X-ray spectroscopy Analytical chemistry Surfaces and Interfaces General Chemistry Atomic layer deposition X-ray photoelectron spectroscopy Fluidized bed Transmission electron microscopy Thin film Fourier transform infrared spectroscopy |
| Zdroj: | Chemical Vapor Deposition. 11:420-425 |
| ISSN: | 1521-3862 0948-1907 |
| DOI: | 10.1002/cvde.200506392 |
| Popis: | Silica nanoparticles (40 nm) were individually and conformally coated with alumina films using atomic layer deposition (ALD) in a fluidized bed reactor. Films were deposited using self-limiting sequential surface reactions of trimethylaluminum and water. Alumina vibrational modes were observed using Fourier-transform infrared spectroscopy (FTIR). X-ray photoelectron spectroscopy (XPS) indicated complete coverage on the surface as the silica features were completely attenuated. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) showed high uniformity of the deposited films. Transmission electron microscopy (TEM) revealed extremely conformal films with an average growth rate of 0.11 nm per cycle. Self-limiting characteristics of ALD allowed primary nanoparticles to be coated as they fluidized as dynamic aggregates. |
| Databáze: | OpenAIRE |
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