| Autor: |
Patricia G. Blauner, J. Mauer, S. J. Kirch, Alfred Wagner, J. P. Levin, Peter P. Longo |
| Rok vydání: |
1990 |
| Předmět: |
|
| Zdroj: |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1557 |
| ISSN: |
0734-211X |
| DOI: |
10.1116/1.585115 |
| Popis: |
The application of focused ion beams to the repair of defects in x‐ray masks is described. An image of the defective region on the mask is obtained using the ion beam in a manner analogous to a scanning electron microscope. Opaque defects are removed by physical sputtering of extra absorber. Clear defects are repaired by ion‐beam‐induced decomposition of an organometallic compound to form an opaque film on the substrate. Examples illustrating the repair process and demonstrating submicron spatial resolution are presented. The effect of ion channeling on imaging and opaque repair is also described. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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