Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring

Autor:	陈德应 Chen Deying, 刘丹丹 Liu Dandan, 焦宏飞 Jiao Hongfei, 宋洪君 Song Hongjun, 王占山 Wang Zhanshan, 沈正祥 Shen Zhengxiang, 马彬 Ma Bin, 季一勤 Ji Yiqin, 刘华松 Liu Huasong, 程鑫彬 Cheng Xinbin
Rok vydání:	2011
Předmět:	Materials science Fabrication Ion beam sputtering deposition business.industry Broadband Optoelectronics Antireflection coating Electrical and Electronic Engineering business Atomic and Molecular Physics and Optics Power (physics)
Zdroj:	High Power Laser and Particle Beams. 23:407-411
ISSN:	1001-4322
DOI:	10.3788/hplpb20112302.0407
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c1d07917584b3120231ec06703f9bc72 https://doi.org/10.3788/hplpb20112302.0407 Zobrazit plný text záznamu