Halo and LDD Engineering for Multiple VT High Performance Analog Devices in 0.13μm CMOS Technology

Autor:	J. C. Guo, C.M. Wu, W.Y. Lien, C. C. Liur
Rok vydání:	2004
Předmět:	Materials science CMOS business.industry Electrical engineering Halo business
Zdroj:	Extended Abstracts of the 2004 International Conference on Solid State Devices and Materials.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c158dfccb06442f2d07c622d99ad0c10 https://doi.org/10.7567/ssdm.2004.a-10-1 Zobrazit plný text záznamu