Analysis of surface particles by time-of-flight secondary ion mass spectrometry

Autor:	D.F. Reich, Paul K. Chu, R.W. Odom
Rok vydání:	1996
Předmět:	Secondary ion mass spectrometry Time of flight Range (particle radiation) Chemistry Analytical chemistry Particle General Materials Science Nanometre Particle size Semiconductor device Condensed Matter Physics Microanalysis
Zdroj:	Materials Chemistry and Physics. 43:87-94
ISSN:	0254-0584
DOI:	10.1016/0254-0584(96)01606-9
Popis:	A major cause of semiconductor device failure is contamination of the device surface by particulate matters from process chemicals, airborne particles, or particles flaking off from process equipment. Particle sizes range from tens of micrometers to tens of nanometers in diameter. The new time-of-flight (TOF-SIMS) technique is well suited for this type of analysis because of its high sensitivity, excellent mass and lateral resolution, and unlimited mass range. As an illustration of its potential, data were acquired from different types of particles on solid substrates, and the results demonstrate direct in situ elemental and molecular microanalysis of submicrometer particulates.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c0f7b21360867ac04bb4c8ba4d6cdb12 https://doi.org/10.1016/0254-0584(96)01606-9 Zobrazit plný text záznamu Full Text from ScienceDirect