Precision Flexure Mechanisms in High Speed Nanopatterning Systems

Autor:	Byung Jin Choi, Sidlgata V. Sreenivasan, M. Meissl
Rok vydání:	2013
Předmět:	Engineering business.industry Physics::Optics Integrated circuit law.invention Nanoimprint lithography Computer Science::Emerging Technologies Nanolithography Machining law Hardware_INTEGRATEDCIRCUITS Electronic engineering Wafer Photolithography Photonics Actuator business
Zdroj:	Advances in Mechanisms, Robotics and Design Education and Research ISBN: 9783319003979
DOI:	10.1007/978-3-319-00398-6_10
Popis:	Semiconductor wafer nanolithography machines integrate nano-scale precision mechanisms with advanced optical and mechatronic modules to achieve highly controlled nanopatterning capability for fabricating advanced integrated circuits, photonics, and optoelectronic devices. The machines achieve their precision by combining the use of highly repeatable nano-resolution actuators and motion systems, and on-tool precision calibration that is typically required for assembled systems since the sub-system machining precision is inherently insufficient.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c0d36f02f6f265ba8311add553ef83b8 https://doi.org/10.1007/978-3-319-00398-6_10 Zobrazit plný text záznamu