Laser-induced thermo-chemical etching of ceramics. Etching characteristics in CF4 gas
Autor: | Teruhiro Yasuda, Hachiro Tsuchiya, Koji Kawahara, Makoto Miyazaki, Hidekazu Goto, Yuzo Mori |
---|---|
Rok vydání: | 1988 |
Předmět: |
Materials science
Mechanical Engineering fungi technology industry and agriculture macromolecular substances Laser Isotropic etching law.invention Crystal stomatognathic system law Etching (microfabrication) visual_art Thermo chemical visual_art.visual_art_medium Dry etching Ceramic Reactive-ion etching Composite material |
Zdroj: | Journal of the Japan Society for Precision Engineering. 54:903-908 |
ISSN: | 1882-675X 0912-0289 |
Popis: | CO2 laser was used to induce localized thermo-chemical etching of ZrO2, Al2O3 and Si3N4 in CF4gas, and the etching characteristics were investigated. The etching rate obtained in CF4 gas was several times greater than the one obtained in air. The etched hole was not accompained by surface cracks and melted materials, and the crystal grain was observed on the etched surface. |
Databáze: | OpenAIRE |
Externí odkaz: |