The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
| Autor: | Arutiun P. Ehiasarian, Martina Lattemann, Y. Aranda Gonzalvo, Jon Tomas Gudmundsson, Johan Böhlmark, Nils Brenning, Ulf Helmersson |
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| Rok vydání: | 2006 |
| Předmět: |
Physics::Instrumentation and Detectors
Chemistry Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Impulse (physics) Sputter deposition Computer Science::Other Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion Condensed Matter::Materials Science Physics::Plasma Physics Sputtering Ionization Physical vapor deposition Materials Chemistry Physics::Atomic Physics High-power impulse magnetron sputtering Atomic physics Titanium |
| Zdroj: | Thin Solid Films. 515:1522-1526 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2006.04.051 |
| Popis: | The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses ... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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