InGaAsP/InP distributed feedback laser wafers grown by an interrupted liquid phase epitaxy technique
Autor: | D.G. Knight, W. Benyon |
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Rok vydání: | 1988 |
Předmět: | |
Zdroj: | Journal of Crystal Growth. 92:659-662 |
ISSN: | 0022-0248 |
DOI: | 10.1016/0022-0248(88)90050-4 |
Popis: | An interrupted liquid phase epitaxy technique for the growth of InGaAsP/InP distributed feedback laser wafers is described, which uses low temperature growth of an initial γ=1.0 μm InGaAsP cladding layer followed by high temperature growth of all subsequent layers. The partially grown wafer is protected by an overpressure of phosphorus supplied by an InP:Sn solution while soaking the high temperature melts. Thermal degradation of the partially grown wafers was not noted, as determined by microscopic examination and photoluminescence studies of γ=1.0 μm cladding layers. |
Databáze: | OpenAIRE |
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