InGaAsP/InP distributed feedback laser wafers grown by an interrupted liquid phase epitaxy technique

Autor: D.G. Knight, W. Benyon
Rok vydání: 1988
Předmět:
Zdroj: Journal of Crystal Growth. 92:659-662
ISSN: 0022-0248
DOI: 10.1016/0022-0248(88)90050-4
Popis: An interrupted liquid phase epitaxy technique for the growth of InGaAsP/InP distributed feedback laser wafers is described, which uses low temperature growth of an initial γ=1.0 μm InGaAsP cladding layer followed by high temperature growth of all subsequent layers. The partially grown wafer is protected by an overpressure of phosphorus supplied by an InP:Sn solution while soaking the high temperature melts. Thermal degradation of the partially grown wafers was not noted, as determined by microscopic examination and photoluminescence studies of γ=1.0 μm cladding layers.
Databáze: OpenAIRE