Germanium junction field effect transistor for cryogenic applications

Autor: C. Monroy, N.C Das, M. Jhabvala
Rok vydání: 2000
Předmět:
Zdroj: Solid-State Electronics. 44:937-940
ISSN: 0038-1101
DOI: 10.1016/s0038-1101(00)00013-7
Popis: The n-channel germanium junction field effect transistor (Ge-JFET) was designed and fabricated for cryogenic applications. Ideal device current and voltage characteristics were obtained at cryogenic temperatures down to the liquid helium temperature (4.2 K). The Ge-JFET exhibits a superior noise performance at the liquid nitrogen temperature (77 K). From the device current voltage characteristics of n-channel JFETs, it is seen that the transconductance increases monotonically with the lowering of temperature to 4.2 K.
Databáze: OpenAIRE