Precise patterning of diamond films for MEMS application
| Autor: | Jian Zhang, WY（王渭源） Wang, Haiqing Gong, GD Hong, Xb Wang, BL Lin |
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| Rok vydání: | 2002 |
| Předmět: |
Microelectromechanical systems
Micrometer scale Materials science Metals and Alloys Nucleation Diamond Nanotechnology Photoresist engineering.material Industrial and Manufacturing Engineering Computer Science Applications Microwave plasma chemical vapor deposition Carbon film Modeling and Simulation Ceramics and Composites engineering Beam (structure) |
| Zdroj: | Journal of Materials Processing Technology. 127:230-233 |
| ISSN: | 0924-0136 |
| Popis: | To apply diamond films in microelectromechanical systems (MEMS), it is necessary to develop suitable techniques to pattern diamond films in micrometer scale. In this paper, three different techniques capable of precise patterning diamond films will be demonstrated. One is to selectively grow diamond films in the desired region by pre-improving the diamond nucleation density in the said region using DC bias-enhanced microwave plasma chemical vapor deposition (MPCVD). Another technique is to selectively grow diamond films in the desired region by seeding the given region using diamond-powder-mixed photoresist. The third technique is to selectively etch large-area diamond film by an oxygen-ion beam under an Al mask. Several diamond-film patterns with a feature size of a few micrometers were successfully fabricated, and some technical problems encountered in the techniques are discussed. |
| Databáze: | OpenAIRE |
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