Scanning Tunneling Microscopy for Metal Deposition Studies

Autor:	M. A. Schneeweiss, D. M. Kolb
Rok vydání:	1999
Předmět:	Chemistry business.industry Mineralogy Nanotechnology Conductive atomic force microscopy Electrochemical scanning tunneling microscope Corrosion Refining Plating Electrochemistry Microelectronics Electron beam-induced deposition business Surface finishing
Zdroj:	The Electrochemical Society Interface. 8:26-30
ISSN:	1944-8783 1064-8208
DOI:	10.1149/2.f05991if
Popis:	Electrolytic metal deposition, particularly from aqueous solution, provides the basis for a number of indispensable industrial applications such as metal winning and refining, metal plating for corrosion protection, and surface finishing. Circuit board manufacturing in microelectronics, in particular, has renewed interest in the research of metal deposition. In addition to its industrial significance, electrodeposition is also of principal interest in regard to its fundamentals, such as, the investigation of electrocrystallization phenomena.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::bfdc02a7679c70e5f89247ef7838e97c https://doi.org/10.1149/2.f05991if Zobrazit plný text záznamu