Analytical and chemical techniques in the study of surface species in atomic layer epitaxy
| Autor: | Tuomo Suntola, Eeva-Liisa Lakomaa, Suvi Haukka |
|---|---|
| Rok vydání: | 1993 |
| Předmět: |
Reaction step
Chemistry Ultra-high vacuum Metals and Alloys Analytical chemistry Substrate (chemistry) Infrared spectroscopy 02 engineering and technology Surfaces and Interfaces 010402 general chemistry 021001 nanoscience & nanotechnology Epitaxy 01 natural sciences Isotropic etching 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Materials Chemistry Atomic layer epitaxy Surface layer 0210 nano-technology |
| Zdroj: | Thin Solid Films. 225:280-283 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(93)90170-t |
| Popis: | An extension of atomic layer epitaxy (ALE) to a porous, high-surface-area substrate commonly used in catalysis is presented. Because of the high surface area, even a sublayer of species bound to the substrate in an ALE sequence can be determined quantitatively. Thus, various analytical and chemical techniques, in addition to the high vacuum techniques, can be applied in the study of surface reaction sand surface species in ALE after a single reaction step. Use of Fourier transform IR spectroscopy, nuclear magnetic resonance, X-ray diffraction, chemical analysis and etching experiments in the characterization of different titanium species on porous silica processed using TiCl4 and H2O is presented. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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