Controlling the Structural and Optical Properties of Ta3N5 Films through Nitridation Temperature and the Nature of the Ta Metal
| Autor: | Arturas Vailionis, Thomas F. Jaramillo, Blaise A. Pinaud |
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| Rok vydání: | 2014 |
| Předmět: |
Inert
Thermal oxidation Materials science Scattering General Chemical Engineering Tantalum chemistry.chemical_element General Chemistry Substrate (electronics) Metal Crystallography Chemical engineering chemistry visual_art Materials Chemistry visual_art.visual_art_medium Thin film Electronic band structure |
| Zdroj: | Chemistry of Materials. 26:1576-1582 |
| ISSN: | 1520-5002 0897-4756 |
| DOI: | 10.1021/cm403482s |
| Popis: | The development of a reliable synthetic route to produce high performance Ta3N5 photoanodes has been complicated by the large number of synthetic parameters, notably nitridation conditions. A systematic study of nitridation from 850 °C–1000 °C reveals that, contrary to common knowledge, nitridation temperature has little effect on the quality of the Ta3N5 produced. Rather, it is the nature of the tantalum starting material and substrate that play a key role. Ta3N5 films synthesized by thermal oxidation and subsequent nitridation of Ta thin films on inert fused silica substrates exhibit identical structural and optical properties, regardless of preparation temperature. The optical spectra collected on these samples reveal clear, distinct features that give insight into the electronic band structure. Films grown in the same manner on Ta foils, however, reveal that textured Ta2N is formed at the Ta3N5/Ta interface even at low temperature, as shown by grazing incidence X-ray scattering. Ta3N5 on Ta foils is c... |
| Databáze: | OpenAIRE |
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