A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources

Autor:	Byeong-Soo Bae, Kwangsoo No, Seungbum Hong, Sang-Gyun Woo, Eunah Kim, Sung-Chul Lim, Young-Bum Koh
Rok vydání:	1996
Předmět:	Materials science Analytical chemistry Surfaces and Interfaces Sputter deposition Condensed Matter Physics Erosion rate Surfaces Coatings and Films Magnetic field Planar Magnet Cavity magnetron High-power impulse magnetron sputtering Thin film Composite material
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:2721-2727
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.580193
Popis:	The thickness profile of the film deposited by planar circular‐type magnetron is simulated considering the relationship between magnetic field profile and target erosion rate. The model is confirmed by the measurement of the film thickness profiles of the Cr films deposited in this study. It is found that the model is applicable to the magnetron sputtering process at low gas pressure. Furthermore, it can be used to predict the thickness profile of the films deposited by magnetron sputtering with various shapes of magnets.
Databáze:	OpenAIRE
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