Friction control by engineering the crystallographic orientation of the lubricating few-layer MoS2 films
| Autor: | Michal Bodík, Karol Vegso, M. Tapajna, Eva Majkova, Peter Siffalovic, M. Truchly, Matej Jergel, M. Sojková, Marianna Španková, Martin Hulman |
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| Rok vydání: | 2021 |
| Předmět: |
Phonon
General Physics and Astronomy 02 engineering and technology Surfaces and Interfaces General Chemistry Tribology 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Crystallography symbols.namesake Orientation (geometry) symbols Thin film van der Waals force 0210 nano-technology Coefficient of friction Layer (electronics) Nanoscopic scale |
| Zdroj: | Applied Surface Science. 540:148328 |
| ISSN: | 0169-4332 |
| Popis: | Tribological properties of a surface are controlled by its topography and chemical structure as suggested by theoretical studies. However, the effect of crystallographic orientation on the tribological properties is still controversial. By tuning the heating rate during sulfurization of CVD Mo films, we prepared the few-layer MoS2 films with similar surface topography but different crystallographic c-axis orientation. This resulted in distinctly different tribological behavior both on the nanoscale and macroscale that can be attributed to different surface chemistry and surface electronic and phonon structures. In particular, horizontally aligned MoS2 sheets with c-axis oriented along the surface normal favor the weak van der Waals forces which resulted in a twice lower coefficient of friction comparing to the vertically aligned MoS2 sheets. These results demonstrate the possibility to optimize tribological properties by crystallographic orientation as required for the thin solid-state lubricating layers for extreme conditions. |
| Databáze: | OpenAIRE |
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