Effect of surface states on monolayer doping: Crystal orientations, crystallinities, and surface defects
Autor: | Sang Min Jung, Moo Whan Shin, Il To Kim, Jin Hwan Kim, Chul Jin Park |
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Rok vydání: | 2018 |
Předmět: |
Materials science
Silicon Hydrosilylation Mechanical Engineering Doping chemistry.chemical_element 02 engineering and technology Semiconductor device 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Crystal chemistry.chemical_compound chemistry Mechanics of Materials Chemical physics Monolayer Surface modification General Materials Science 0210 nano-technology Surface states |
Zdroj: | Materials Science in Semiconductor Processing. 82:67-74 |
ISSN: | 1369-8001 |
Popis: | Monolayer doping (MLD) has been regarded as the most suitable doping method for future semiconductor devices. MLD based on surface functionalization can be seriously affected by the surface states, including the orientations, crystallinities, and defects. We report for the first time the effect of surface states on boron-MLD (B-MLD) process and discuss the applicability of MLD for a fin structures. Depending on the surface states, the monolayer formation reaction is restricted, which causes more than five-fold differences in the doping level. Therefore, the surface states should be gravely considered before applying MLD and are crucial constraints in the MLD process on non-planar structures that have different surface states depending on its structural position. The B-MLD process on as-cleaned (100) and (110) silicon surfaces provides doping levels of 4.69 × 1020 and 2.48 × 1020 atoms/cm3, respectively. The MLD efficiency on the (110) orientation is degraded by insufficient reaction sites for the hydrosilylation reaction on the monohydride-terminated (110) silicon surface. Additionally, the surface damage interrupts the formation of a dopant-containing monolayer, causing a poor doping level and dose uniformity. Our research provides new insights into the development of wet-chemical doping methods for non-planar devices by studying the effect of surface states on MLD efficiency. |
Databáze: | OpenAIRE |
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