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Thallium bromide is a promising candidate material for photodetectors in medical imaging systems. This work investigates the structural, optical and electrical properties of thermally evaporated TlBr films. The main fabrication parameter is the number of depositions. The use of sequential runs is aimed to increase the thickness of the films, as necessary, for technological applications. We deposited films using one–four runs, that led to maximum thickness of about 50 μm. Crystallographic and morphological changes were observed with varying deposition runs. Nevertheless, the optical gap and electrical resistivity in the dark remained constant at about 2.85 eV and 10 9 Ω cm, respectively. Thicker samples have a larger ratio of photo-to-dark signal under medical X-ray exposure, with a larger linear region as a function of applied voltage. The results are discussed aiming at future technological applications in medical imaging. |
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