Switching Mode and Mechanism in Binary Oxide Resistive Random Access Memory Using Ni Electrode

Autor:	Wen Hsiung Chang, Jun Hung Lin, Jhe Wei Chang, Wen Yueh Jang, Cheng Tung Chou, Tuo-Hung Hou, Tan Fu Lei, Chen Hsi Lin, Kuan Liang Lin, Jiann Shieh, Yao Jen Lee
Rok vydání:	2013
Předmět:	Materials science Bilayer General Engineering Oxide General Physics and Astronomy Nanotechnology Amorphous solid Resistive random-access memory Secondary ion mass spectrometry Crystallinity chemistry.chemical_compound chemistry Chemical physics Electrode Crystallite
Zdroj:	Japanese Journal of Applied Physics. 52:031801
ISSN:	1347-4065 0021-4922
DOI:	10.7567/jjap.52.031801
Popis:	Resistive-switching (RS) modes in different CMOS-compatible binary oxides have been shown to be governed by the interplay with the Ni top electrode. Unipolar RS and metallic low-resistance state in polycrystalline HfO2 and ZrO2 are distinct from the preferential bipolar RS and semiconductive low-resistance state in amorphous Al2O3 and SiO2. Backside secondary ion mass spectrometry (SIMS) has shown the formation of Ni filaments in HfO2, in contrast to the formation of oxygen-vacancy filaments in Al2O3. The differences have been explained by strong dependence of Ni migration on the oxide crystallinity. Additionally, the RS mode can be further tailored using bilayer structures. The oxide layer next to the Si bottom electrode and its tendency of forming Ni filaments play significant roles in unipolar RS in the bilayer structures, in support of the conical-shape Ni filament model where the connecting and rupture of filaments for unipolar RS occur at the smallest diameter near the bottom electrodes.
Databáze:	OpenAIRE
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