Mechanisms of nanoporous VN–Ar/He structure formation under high-energy ion bombardment

Autor:	E. Melnikova, A. G. Guglya, I. G. Marchenko, R.L. Vasilenko, M. L. Litvinenko, I. V. Sassa, V. V. Bryk
Rok vydání:	2011
Předmět:	Nuclear and High Energy Physics Radiation Materials science Nanoporous Vanadium nitride Ion plating Nucleation Condensed Matter Physics chemistry.chemical_compound Ion beam deposition Chemical engineering chemistry Deposition (phase transition) General Materials Science Electron beam-induced deposition Ion beam-assisted deposition
Zdroj:	Radiation Effects and Defects in Solids. 166:282-287
ISSN:	1029-4953 1042-0150
DOI:	10.1080/10420150.2010.538928
Popis:	The initial stages of formation of VN–Ar/He nanocrystalline thin films that were obtained using ion beam-assisted deposition technology have been investigated. It has been shown that the vanadium deposition accompanied by mixed inert and reactive gas beam bombardment leads to the formation of a nanoporous structure. The electron microscopic data and computer simulation results prove that many different processes take place during film structure nucleation, in particular, metal atom deposition, gas–vacancy cluster formation, and their migration, growth and collapse with gas release. As a result, vacant and gas-filled pores with a diameter of 5–50 nm were created.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::bd002ae5e869675c8a3015ca298089dd https://doi.org/10.1080/10420150.2010.538928 Zobrazit plný text záznamu Plný text ve formátu PDF Plný text ve formátu HTML
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