Nanoimprint lithography with ≤60 nm overlay precision

Autor:	Wen-Di Li, Xuema Li, Robert G. Walmsley, Wei Wu, R. Stanley Williams
Rok vydání:	2012
Předmět:	Materials science business.industry Nanotechnology General Chemistry Overlay Nanoimprint lithography law.invention law Optoelectronics General Materials Science Wafer business Lithography Next-generation lithography
Zdroj:	Applied Physics A. 106:767-772
ISSN:	1432-0630 0947-8396
DOI:	10.1007/s00339-012-6775-z
Popis:	Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::bc846b6e45718f0e04655b9fcb70db9f https://doi.org/10.1007/s00339-012-6775-z Zobrazit plný text záznamu Plný text ve formátu PDF