Measurement of the Deformation of Silicon Substrates Coated with a Plasma-Polymerized Acrylonitrile Film

Autor:	Hao Jiang, David P. Sisler, Vincent P. Tondiglia, Jesse O. Enlow, Rachel Jakubiak
Rok vydání:	2010
Předmět:	Materials science Silicon technology industry and agriculture Strain measurement chemistry.chemical_element macromolecular substances Plasma Deformation (meteorology) chemistry.chemical_compound Interferometry Polymerization chemistry Thin film Composite material Acrylonitrile
Zdroj:	Optical Interference Coatings.
DOI:	10.1364/oic.2010.wb7
Popis:	A sensitive interferometric method is employed to quantify the deformation of silicon substrates coated with thin plasma-polymerized acrylonitrile film deposited at room temperature. This provides insight into the structural variation of plasma polymerized films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::bb52554c132ef2aa8e0c3a2c0eb34aff https://doi.org/10.1364/oic.2010.wb7 Zobrazit plný text záznamu