Universal chemical vapour deposition system for metallurgical coatings
| Autor: | Manfred Stolz, Konrad Hieber, Claudia Ing. Grad. Wieczorek |
|---|---|
| Rok vydání: | 1983 |
| Předmět: |
Materials science
Annealing (metallurgy) Metallurgy Metals and Alloys Tantalum chemistry.chemical_element Surfaces and Interfaces Chemical vapor deposition engineering.material Electrostatic spray-assisted vapour deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Coating Molybdenum Materials Chemistry engineering Tin Deposition process |
| Zdroj: | Thin Solid Films. 100:209-218 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(83)90278-x |
| Popis: | A versatile chemical vapour deposition system was constructed. The r.f.-heated reactor can operate in the cold-wall mode as well as the hot-wall mode. In addition quenching and annealing can be performed in the reactor immediately after the deposition process. The reactor is well suited for depositing various materials onto substrates of different geometrical shapes. This was demonstrated by coating the inner surfaces of hollow parts with tantalum, by coating molybdenum grids for power tubes with ZrC and by coating small steel springs with TiC/TiN. |
| Databáze: | OpenAIRE |
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