The effect of mask substrate and mask process steps on patterned photomask flatness

Autor:	Michael S. Hibbs, Max G. Levy, Monica Barrett, Kenneth C. Racette
Rok vydání:	2005
Předmět:	Engineering business.industry Flatness (systems theory) Substrate (printing) Blank law.invention Optics Resist Mask set law Photolithography Photomask business Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.599598
Popis:	Photomask substrate, blank, and finished mask flatness are becoming more serious concerns for photomask fabrication. Most commercial and captive mask houses now use a combination of mask blanks at various flatness levels from >2.0um to
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ba944b9d317d2a635df6119c240da462 https://doi.org/10.1117/12.599598 Zobrazit plný text záznamu