Sub-wavelength printing using multiple overlapping masks
| Autor: | F. Klemens, Stanley Pau, Omkaram Nalamasu, G. P. Watson, Allen G. Timko, J. Frackoviak, Gregory Timp, R. Cirelli |
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| Rok vydání: | 2000 |
| Předmět: |
Multiple exposure
business.industry Computer science Process (computing) Condensed Matter Physics Atomic and Molecular Physics and Optics Light scattering Surfaces Coatings and Films Electronic Optical and Magnetic Materials Impression Wavelength Optics Feature (computer vision) Electrical and Electronic Engineering business Lithography Critical dimension |
| Zdroj: | Microelectronic Engineering. 53:119-122 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(00)00277-x |
| Popis: | A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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