The effects of RF-sputtered TiO 2 top layer on pore structure of composite ceramic membranes
| Autor: | A. Samimi, F. Abdollahzadeh Davani, S. Khamseh |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Pore size
Materials science Scanning electron microscope Surfaces and Interfaces General Chemistry Substrate (electronics) Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Membrane visual_art Composite ceramic Materials Chemistry visual_art.visual_art_medium Ceramic Composite material Layer (electronics) |
| Zdroj: | Surface and Coatings Technology. 258:1256-1258 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2014.07.014 |
| Popis: | Composite ceramic membranes which consist of α-Al 2 O 3 as support layer and γ-Al 2 O 3 as intermediate layer are used as substrate. The technique of RF-sputtering has been used to deposit TiO 2 film as top layer on ceramic membranes in order to tailor composite membrane's pore size and antibacterial purposes. Scanning electron microscopy observation showed that the pore size of the ceramic membranes decreases with increasing the RF-sputtering power. The thickness of the deposited TiO 2 films increased with increasing the RF-sputtering power. It has been found that a dense and uniform TiO 2 film can be formed using RF-sputtering system whose thickness can be tuned by varying the RF-sputtering power. |
| Databáze: | OpenAIRE |
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