3-Phenyl-3,3-ethylenedioxy-1-propyl Sulfonates as Acid Amplifiers To Enhance the Photosensitivity of Positive-Working Photoresists
| Autor: | Hironori Ohmori, Kunihiro Ichimura, Koji Arimitsu, Hiromitsu Ito, Kazuaki Kudo |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
chemistry.chemical_classification
Materials science General Chemical Engineering Thermal decomposition General Chemistry Polymer Photoresist Combinatorial chemistry Matrix (chemical analysis) Acid catalysis chemistry.chemical_compound Sulfonate chemistry Photosensitivity Polymer chemistry Materials Chemistry Ethylenedioxy |
| Zdroj: | Chemistry of Materials. 11:2119-2125 |
| ISSN: | 1520-5002 0897-4756 |
| DOI: | 10.1021/cm990054b |
| Popis: | In the presence of a small amount of acid, 3-phenyl-3,3-ethylenedioxy-1-propyl p-toluenesulfonate autocatalytically decomposed to give p-toluenesulfonic acid both in solution and in a polymer matrix. Such a reaction was successfully applied for the improvement of sensitivity of several positive-working chemical-amplification photoresists. It was revealed that the diffusion of the acid plays the most essential role in the sensitivity enhancement, by determining the addition effect of the acid amplifiers with various arenesulfonates on photosensitivity characteristics. |
| Databáze: | OpenAIRE |
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