Isotopic effects in a–C:(H/D) films deposited from methane/hydrogen RF plasmas
| Autor: | D. Boutard, W. Möller |
|---|---|
| Rok vydání: | 1990 |
| Předmět: |
chemistry.chemical_classification
Materials science Hydrogen Mechanical Engineering Analytical chemistry chemistry.chemical_element Plasma Condensed Matter Physics Methane Amorphous solid chemistry.chemical_compound Hydrocarbon chemistry Mechanics of Materials Deposition (phase transition) General Materials Science Gas composition Refractive index |
| Zdroj: | Journal of Materials Research. 5:2451-2455 |
| ISSN: | 2044-5326 0884-2914 |
| DOI: | 10.1557/jmr.1990.2451 |
| Popis: | Hard amorphous hydrocarbon films have been deposited by RF glow discharges in methane/hydrogen mixtures with different hydrogen isotopes. For CH4 + D2 and CD4 + H2 gas mixtures, the film growth rate, the density, the refractive index, and the isotopic hydrogen content are obtained as functions of the process gas composition. Further, the hydrogen loss induced by 15 keV helium ions is studied. The results are qualitatively interpreted in terms of different effects of ion bombardment during film deposition which influence the properties of the resulting films. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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