Plasma technologies for material processing in nanoelectronics: Problems and solutions
| Autor: | E. G. Shustin |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Radiation Materials processing Computer science business.industry Electrical engineering Volume (computing) 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Electronic Optical and Magnetic Materials Nanoelectronics Telecommunications engineering 0103 physical sciences Electronics Electrical and Electronic Engineering 0210 nano-technology business |
| Zdroj: | Journal of Communications Technology and Electronics. 62:454-465 |
| ISSN: | 1555-6557 1064-2269 |
| Popis: | The review considers plasma-processing technologies used in solid-state electronics, both widely used and ones, which do not found yet industrial applications. Several from them are developed specifically for creating nanoelectronic devices. Tendencies toward an increase in the working rate and memory volume and a decrease in the sizes of telecommunication systems necessitate the development of electronic devices based on new principles and, hence, the corresponding technologies for implementation. Physical problems that impede the application of conventional methods in new problems are analyzed, and possible solutions are proposed. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink