Optimization of 3D Stacked Nanosheets in 5nm Gate-all-around Transistor Technology

Autor:	Anil Kumar Gundu, Volkan Kursun
Rok vydání:	2021
Zdroj:	2021 IEEE 34th International System-on-Chip Conference (SOCC).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b9f97bf393753ca746ae87ae3cc94a65 https://doi.org/10.1109/socc52499.2021.9739517 Zobrazit plný text záznamu