A study on the Properties of Cu/SiOC(-H)/p-Si(100) and Cu/TaN/SiOC(-H)/p-Si(100) Interface
| Autor: | Chang Young Kim, Jong-Kwan Woo, Heang Seuk Lee, Younghun Yu, Chi Kyu Choi, R. Navamathavan |
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| Rok vydání: | 2009 |
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| Zdroj: | Journal of the Korean Physical Society. 55:1960-1964 |
| ISSN: | 0374-4884 |
| DOI: | 10.3938/jkps.55.1960 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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