High‐rate aluminum oxide deposition by MetaModeTM reactive sputtering

Autor:	R. B. Sargent, J. P. Lehan, R. E. Klinger
Rok vydání:	1992
Předmět:	Aluminium oxides Chemistry Mineralogy Surfaces and Interfaces Condensed Matter Physics Surfaces Coatings and Films Stress (mechanics) Sputtering Deposition (phase transition) Composite material Thin film Refractive index Current density Order of magnitude
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:3401-3406
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.577791
Popis:	MetaModeTM reactive sputtering was employed to produce optical quality aluminum oxide films at rates an order of magnitude higher than those possible with conventional reactive magnetron sputtering. System pressure, reactive‐to‐nonreactive gas flow ratio, and ion‐source current density were varied to investigate their effects on rate, process stability, and film properties. It was found that the coatings deposited at a reduced pressure (0.27 Pa) produced dense, water‐free coatings without compromising optical quality or deposition rate.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b9527cf69c260d4b99afd9386d97410f https://doi.org/10.1116/1.577791 Zobrazit plný text záznamu