1003 Polishing Characteristics of Difficult-to-machine Materials Under Various Gas Conditions Controlled by High Pressure Chamber Type CMP Machine : Evaluation of Polishing Characteristics Using Elemental Analysis

Autor:	Daizo Ichikawa, Michio Uneda, Takateru Egashira, Toshirou Doi, Isamu Koshiyama, Osamu Ohnishi, Syuuhei Kurokawa
Rok vydání:	2013
Předmět:	Materials science Elemental analysis Metallurgy Mineralogy Polishing High pressure chamber
Zdroj:	The Proceedings of Conference of Kyushu Branch. :319-320
ISSN:	2424-2780
DOI:	10.1299/jsmekyushu.2013.66.319
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b94a860629af1de45cd0f48269f9b58b https://doi.org/10.1299/jsmekyushu.2013.66.319 Zobrazit plný text záznamu