A Deep X-ray Lithography beamline at the Kurchatov Synchrotron Radiation Source: First results

Autor:	G.A. Kovachov, O.E. Latish, A. Schmidt, Gregor Feiertag, A. N. Artemiev, T.Y. Rakhimbabaev, S. Peredkov, D.G. Odintsov, E.S. Tzvid, V.V. Martynenko, V.P. Moryakov, V.A. Kolyasnikov, V.G. Stankevitch, I.N. Bushev, M. Schmidt, B.I. Nikitin
Rok vydání:	1998
Předmět:	Physics Nuclear and High Energy Physics business.industry Synchrotron Radiation Source Synchrotron radiation Optics Beamline Resist Critical energy X-ray lithography Irradiation business Instrumentation Lithography
Zdroj:	Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 405:496-499
ISSN:	0168-9002
DOI:	10.1016/s0168-9002(96)01129-1
Popis:	A Deep X-ray Lithography (DXRL) beamline at the Kurchatov Synchrotron Radiation Source (KSRS) has been constructed and commissioned. For the irradiation a simple exposure apparatus and synchrotron radiation with a critical energy of about 7 keV was used. Samples with resist thickness of 300 μm and 500 μm have been exposed using a test mask. SEM results are shown.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b8967d38aa9850bbbe26137fbb417eec https://doi.org/10.1016/s0168-9002(96)01129-1 Zobrazit plný text záznamu Full Text from ScienceDirect