Organic-Inorganic Hybrid Materials for UV-Nanoimprint Lithography

Autor:	Shigeru Yamaki, Masahiro Mitsuyama, Junko Katayama, Makoto Hanabata
Rok vydání:	2006
Předmět:	Materials science Polymers and Plastics Organic Chemistry Nanoparticle Nanoimprint lithography law.invention chemistry.chemical_compound Monomer chemistry Chemical engineering law Polymer chemistry Materials Chemistry Thermal stability Hybrid material Lithography Photoinitiator Shrinkage
Zdroj:	Journal of Photopolymer Science and Technology. 19:397-402
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.19.397
Popis:	We developed the organic-inorganic hybrid material for UV-nanoimprint lithography (UV-NIL). Silicasol particles were used as inorganic component and modified their surface with photofunctional crosslinkers. These photofunctional silicasol particles were dispersed uniformly into photofunctional monomers with non-solvent systems. They were mixed with other monomers and photoinitiator to prepare various imprint materials. Physical properties and mechanical properties of these materials were examined. The UV-NIL patterns were obtained by using an imprint test machine "LTNIP-5000" from Litho Tech Japan Co. The results showed greatly improved UV hardening properties and physical properties such as refractivity, thermal stability compared to organic (non-hybrid) materials. As a result, 200 nm line and space patterns were successfully imprinted with no shrinkage at pressure of 3.1 MPa and exposure doses of 1 J/cm2.
Databáze:	OpenAIRE
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