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Publisher Summary This chapter provides a general description and two specific applications of ion beam for thin film coating. The typical ion source consists of an enclosure containing electrodes, magnetic fields, ion accelerating grids, and emitters suitably arranged to sustain electron-bombardment ionization of a working gas. Two general arrangements are most popular for application of the ion source to thin film coating. First, ions from the source can be directed at a target, which is sputtered, and the sputtered material is deposited as a thin film. This is termed ion beam sputter deposition (IBS). Second, ions from the source can be directed to the substrate, which is being coated with material generated by some independent technique. A common advantage of ion beam techniques is the degree of flexibility and control provided compared to other techniques that incorporate a gas discharge. Ion beam sources will continue to be incorporated into deposition arrangements and applied to other materials to provide films with improved properties. |
